CALL FOR PAPERS OPTICS + OPTOELECTRONICS - Submit abstracts by 10 November 2020 - SPIE
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2021 CALL FOR PAPERS
2021
OPTICS + OPTOELECTRONICS
CALL FOR
PAPERS
Submit abstracts by 10 November 2020
Conferences: 19-22 April 2021
Exhibition: 20-21 April 2021
Clarion Congress Hotel Prague spie.org/oo21call
Prague, Czech Republic #SPIEOptoelectronics
Conferences: 19-22 April 2021
Exhibition: 20-21 April 2021
Clarion Congress Hotel Prague
Prague, Czech Republic
Your research supports the optoelectronics and
advanced laser technologies
Accelerate the development process
SPIE Optics + Optoelectronics is the leading meeting for scientists, researchers, and
engineers to share their latest breakthroughs, deepen their understanding of important
advances in photonics and enable the most ambitious extreme light projects, and
cultivate meaningful contacts with colleagues and other leading experts.
One programme, 2 tracks,
15 conferences, and 2 workshops
highlight the technologies that drive
Europe’s most exciting advances
in photonics and enable the most
ambitious extreme light projects.
Submit Abstracts by: 10 NOVEMER 2019
spie.org/oo21call
#SPIEOptoelectronics
Plan to Participate
It is our pleasure to welcome your participation at the eighth SPIE 2021
International Symposium on Optics + Optoelectronics. The symposium
GENERAL CHAIRS
offers multiple opportunities to advance your research. An excellent
Bedřich Rus
ELI Beamlines
technical programme has been prepared and organized within two
and Institute of
programme tracks: Emerging Technologies and Research with Extreme Physics, ASCR
Light Sources. v.v.i. (Czech
Close to 800 presentations in 2019 prove that this event is recognized Republic)
as an important forum for science, government, and industry to access
and share information on optical technologies. The event focuses Sasa Bajt
Deutsches
specifically on the research aspects of optics and optoelectronics science
Elektronen-
and technology, with a special emphasis on the existing and upcoming
Synchrotron
European and international laser infrastructures. (Germany)
The symposium features plenary sessions focusing on the current hot
topics, fifteen conferences, and two workshops. With lab tours planned,
the programme promises an exciting week, with excellent science Ivo Rendina
and technology in a setting conducive to international interchange, CNR/Istituto per la
networking, and exchanging ideas. The diversity and breadth of cultural, Microelettronica e
scientific and economic capacities of the city have contributed to Microsistemi
selecting Prague as the host for Optics+Optoelectronics: (Italy)
• Prague is home to the ELI Beamlines facility, the gateway to new
Chris Edwards
regimes in fundamental physics by extreme light. The facility
Central Laser
utilizes high-power, high-repetition-rate lasers for high-field physics Facility, Science
experiments and for generation of high-intensity sources of radiation and Technology
and particles. As an international laser user facility, it opens a new era Facilities Council
of laser-based research, attracting the world’s best scientists to unique (United Kingdom)
research opportunities.
Mike Dunne
• The city continues to be an important centre for research; it is the home
SLAC National
of the Czech Academy of Sciences, and the headquarters of the Institute Accelerator Lab.
of Physics, the Institute of Photonics and Electronics, the Institute (United States)
of Plasma Physics, the Institute of Experimental Medicine, BIOCEV
European Biotechnology and Biomedicine Center, among others.
• As the capital, Prague is not only the cultural and tourist nexus of the
nation, but also the economic one. Prague and the Czech Republic is a base
to many international companies including HP, Boeing, Oracle, Honeywell,
Avast, Thermo Fisher, Microsoft Innovation Center, and Siemens.
We invite you to share the most recent developments and applications
at SPIE Optics + Optoelectronics 2021. Explore the city’s history from
the science perspective and discover the Prague footprints by Tycho de
Brahe, Johannes Kepler, Ernst Mach, Christian Doppler, Bernard Bolzano,
Albert Einstein, Nikola Tesla, Jaroslav Heyrovský, or Otto Wichterle. Join
us for this exciting meeting in the beautiful city of Prague!
1
SPIE OPTICS + OPTOELECTRONICS
Contents
MANAGED BY EMERGING TECHNOLOGIES
OO101 Metamaterials (Vladimír Kuzmiak;
Peter Markos; Tomasz Szoplik) . . . . . . . . . . . . . . . . . . . . . . . . . . . 4
SPIE Europe Ltd., a subsidiary of
SPIE, is a not-for-profit UK-registered
OO102 Nonlinear Optics and Applications
company serving SPIE constituents (Mario Bertolotti; Anatoly V. Zayats; Alexei M. Zheltikov). . . . 5
throughout Europe as an advocate OO103 Quantum Optics and Photon Counting (Ivan Prochazka;
and liaison to political and industry Martin Štefaňák; Roman Sobolewski; Aurél Gábris). . . . . . . . . 6
associations within the European
optics and photonics community.
OO104 Optical Sensors (Francesco Baldini; Jiri Homola;
Robert A. Lieberman). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7
In addition to providing membership
services, SPIE Europe Ltd. organises
OO105 Micro-structured and Specialty Optical Fibres
and manages internationally (Kyriacos Kalli; Alexis Mendez; Pavel Peterka). . . . . . . . . . . . . . 8
recognised conferences, education OO106 Holography: Advances and Modern Trends
programmes, and technical (Antonio Fimia; Miroslav Hrabovský; John T. Sheridan). . . . . 10
exhibitions featuring emerging
technologies in optics and photonics. OO107 Integrated Optics: Design, Devices, Systems and
Applications (Pavel Cheben; Jiří Čtyroký;
SPIE International Headquarters Iñigo Molina-Fernández). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12
PO Box 10 OO108 EUV and X-ray Optics: Synergy between Laboratory and
Bellingham, WA 98227-0010 USA Space (René Hudec; Ladislav Pina). . . . . . . . . . . . . . . . . . . . . . 13
Tel: +1 360 676 3290
Fax: +1 360 647 1445 OO109 High-Power, High-Energy, and High-Intensity Laser
help@spie.org / www.SPIE.org Technology (Joachim Hein). . . . . . . . . . . . . . . . . . . . . . . . . . . . .15
OO110 Short-pulse High-energy Lasers and Ultrafast Optical
SPIE Europe Office Technologies (Pavel Bakule; Constantin L. Haefner). . . . . . . 16
2 Alexandra Gate
Ffordd Pengam, Cardiff, EXTREME LIGHT SOURCES
CF24 2SA UK
Tel: +44 29 2089 4747 OO111 Optics Damage and Materials Processing by EUV/X-ray
Fax: +44 29 2089 4750 Radiation (XDam8) (Libor Juha; Saša Bajt; Stéphane
info@spieeurope.org Guizard). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 17
www.SPIE.org OO112 Relativistic Plasma Waves and Particle Beams as
Coherent and Incoherent Radiation Sources
COOPERATING (Dino A. Jaroszynski; MinSup Hur). . . . . . . . . . . . . . . . . . . . . . . 18
ORGANISATIONS OO113 Laser Acceleration of Electrons, Protons, and Ions
(Stepan S. Bulanov; Jörg Schreiber; Carl B. Schroeder). . . . . 19
OO114 Research Using Extreme Light: Entering New Frontiers
with Petawatt-Class Lasers (Georg Korn; Luis O. Silva). . . 20
OO115 X-Ray Free-Electron Lasers: Advances in Source
Development and Instrumentation (Thomas Tschentscher;
Luc Patthey; Kai Tiedtke; Marco Zangrando). . . . . . . . . . . . . . 21
WORKSHOPS
WS201 Applying Laser-driven Particle Acceleration: Medical and
Nonmedical Uses of Distinctive Energetic Particle and
Photon Sources II (Paul R. Bolton) . . . . . . . . . . . . . . . . . . . . . . 22
WS202 Optical Fiber Technology II (Ivan Kašík) . . . . . . . . . . . . . . . . . 23
Best Student Paper Awards. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24
General Information. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 25
Abstract Submission. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
CALL FOR PAPERS
TECHNICAL COMMITTEE
Saša Bajt, Deutsches Elektronen- Joachim Hein, Friedrich-Schiller- Pavel Peterka, Institute of
Synchrotron (Germany) Univ. Jena (Germany) Photonics and Electronics CAS
Pavel Bakule, ELI Beamlines, Jiri Homola, Institute of Photonics (Czech Republic)
Institute of Physiacs, CAS (Czech and Electronics, CAS (Czech Ladislav Pina, Czech Technical
Republic) Republic) Univ. in Prague (Czech Republic)
Francesco Baldini, Istituto di Fisica Miroslav Hrabovský, Univ. Ivan Prochazka, Czech Technical
Applicata Nello Carrara (Italy) Palackého v Olomouci (Czech Univ. in Prague (Czech Republic)
Republic) Ivo Rendina, CNR/Istituto per la
Mario Bertolotti, Univ. degli Studi
di Roma La Sapienza (Italy) René Hudec, Astronomical Institute Microelettronica e Microsistemi
of the CAS and Czech Technical (Italy)
Paul Bolton, Japan Atomic Energy
Univ. in Prague (Czech Republic) Bedřich Rus, ELI Beamlines,
Agency (Japan)
Dino A. Jaroszynski, Univ. of Institute of Physics, CAS (Czech
Thomas Butcher, Central Laser
Strathclyde (United Kingdom) Republic)
Facility, Science and Technology
Facilities Council, United Kingdom Libor Juha, Institute of Physics, John T. Sheridan, Univ. College
CAS (Czech Republic) Dublin (Ireland)
Jirí Ctyroký, Institute of Photonics
and Electronics, CAS (Czech Kyriacos Kalli, Cyprus Univ. of Roman Sobolewski, Univ. of
Republic) Technology (Cyprus) Rochester (United States)
Pavel Cheben, National Research Ivan Kašík, Institute of Photonics Luis O. Silva, Univ. Técnica de
Council Canada (Canada) and Electronics, CAS (Czech Lisboa (Portugal)
Republic) Jörg Schreiber, Ludwig-
Mike Dunne, SLAC National
Accelerator Lab. (United States) Georg Korn, ELI Beamlines, Maximilians-Univ. München
Institute of Physics, CAS (Czech (Germany)
Chris Edwards, Central Laser
Republic) Carl Schroeder, Lawrence Berkeley
Facility, Science and Technology
Facilities Council, United Kingdom Vladimir Kuzmiak, Institute of National Lab. (United States)
Photonics and Electronics, CAS Martin Štefaňák, Czech Technical
Eric Esarey, Lawrence Berkeley
(Czech Republic) Univ. in Prague (Czech Republic)
National Lab. (United States)
Kenneth W. D. Ledingham, Univ. of Tomasz Szoplik, Univ. of Warsaw
Antonio Fimia-Gil, Univ. Miguel
Strathclyde (United Kingdom) (Poland)
Hernández de Elche (Spain)
Robert A. Lieberman, Intelligent Kai Tiedtke, Deutsches Elektronen-
Aurél Gábris, Wigner Research Ctr.
Optical Systems, Inc. (United Synchrotron (Germany)
for Physics of the H.A.S. (Hungary)
States)
and Czech Technical Univ. in Thomas Tschentscher, European
Prague (Czech Republic) Peter Markos, Comenius Univ. in XFEL GmbH (Germany)
Bratislava (Slovakia)
Antonio Giulietti, CNR (Italy) Marco Zangrando, Elettra-
Alexis Mendez, MCH Engineering Sincrotrone Trieste S.C.p.A. (Italy)
Stéphane Guizard, CEA-DRF-
LLC (United States)
IRAMIS, Lab. des Solides Irradiés Anatoly V. Zayats, King’s College
(France) Iñigo Molina Fernandez, Univ. de London (United Kingdom)
Málaga (Spain)
Constantin L. Haefner, Lawrence Alexei M. Zheltikov, Lomonosov
Livermore Lab. (United States) Luc Patthey, Paul Scherrer Institut Moscow State Univ. (Russian
(Switzerland) Federation)
We are here to ensure that your work is shared with your colleagues.
How that looks may change as world events impact our personal and professional lives. Rest assured,
if the timing of an in-person meeting will not allow us to gather, we will leverage our Digital Forum
platform and virtual meetups to give you alternative ways to connect with your community.
We look forward to seeing you in 2021.
Stay Up to Date via Email
Sign up to receive emails about SPIE Optics + Optoelectronics.
spie.org/signup
3
EMERGING TECHNOLOGIES
Metamaterials (OO101)
Conference Chairs: Vladimír Kuzmiak, Institute of Photonics and Electronics of the ASCR, v.v.i. (Czech
Republic); Peter Markos, Comenius Univ. in Bratislava (Slovakia); Tomasz Szoplik, Univ. of Warsaw
(Poland)
Programme Committee: Javier Aizpurua, Ctr. de Fisica de Materiales, CSIC (Spain), DIPC, Donostia-San
Sebastián (Spain); Tomasz J. Antosiewicz, Univ. of Warsaw (Poland); Alessandro Belardini,
Sapienza Univ. di Roma (Italy); Che Ting Chan, Hong Kong Univ. of Science and Technology (Hong
Kong, China); Jiří Čtyroký, Institute of Photonics and Electronics of the ASCR, v.v.i. (Czech Republic);
Shanhui Fan, Stanford Univ. (United States); F. Javier García de Abajo, ICFO - Institut de Ciències
Fotòniques (Spain); Maria Kafesaki, Foundation for Research and Technology-Hellas (Greece);
Yuri S. Kivshar, The Australian National Univ. (Australia); Andrei V. Lavrinenko, DTU Fotonik
(Denmark); Mangirdas Malinauskas, Vilnius Univ. (Lithuania); Ekmel Özbay, Bilkent Univ. (Turkey);
Concita Sibilia, Univ. degli Studi di Roma La Sapienza (Italy); Mario Silveirinha, Univ. Técnica de
Lisboa (Portugal); Costas M. Soukoulis, Iowa State Univ. (United States); Martin Wegener, Karlsruher
Institut für Technologie (Germany); Nikolay I. Zheludev, Optoelectronics Research Ctr. (United
Kingdom)
The SPIE European conference series on Meta- • analytical and numerical modeling of
materials is returning to Prague with its 16th edi- metamaterials
tion since its conception in 2005. The conference • plasmonics-fundamentals and applications
moves between SPIE Photonics Europe Sympo- • plasmon-enhanced photovoltaics,
sium in even years, while in the odd years the photocatalysis, and fuel cells
conference is held as part of the SPIE Optics + Op- • photonic topological insulators
toelectronics International Symposium in Prague.
• metamaterials for radiative cooling.
The 2021 Prague conference will be focused on
The Prague conference provides a meeting plat-
advances in design of metamaterials and its elec-
form for university researchers and industry pro-
tromagnetic and functional properties. The follow-
fessionals worldwide. Invited talks will be delivered
ing topical sessions are planned:
by world’s top experts in the field of metamaterials.
• metasurfaces and flat optics We cordially invite candidates interested in organi-
• hyperbolic materials and metamaterials zation of sessions on recent developments in fabri-
• active metamaterials cation technologies, characterization methods and
• dielectric metamaterials theoretical approaches to artificial electromagnetic
• 2D materials and metamaterials materials.
• metamaterials fabrication
• acoustic metamaterials
• nonlinear metamaterials
• chiral, toroidal, and magneto-optic
metamaterials
4 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21call
CALL FOR PAPERS
Nonlinear Optics and Applications (OO102)
Conference Chairs: Mario Bertolotti, Univ. degli Studi di Roma La Sapienza (Italy); Anatoly V. Zayats,
King’s College London (United Kingdom); Alexei M. Zheltikov, Lomonosov Moscow State Univ.
(Russian Federation)
Programme Committee: Javier Aizpurua, Centro de Fisica de Materiales (Spain); Kiyoshi Asakawa,
Univ. of Tsukuba (Japan); Sophie Brasselet, Institut Fresnel (France); Bruno Crosignani, Caltech
(Italy); Reinhard Kienberger, Max-Planck-Institut für Quantenoptik (Germany); Yuri S. Kivshar, The
Australian National Univ. (Australia); Jan Perina, Palacky Univ. (Czech Republic); Mark I. Stockman,
Georgia State Univ. (United States)
This conference focuses on the most recent ad- • nonlinear, ultrafast, and quantum plasmonics
vances in nonlinear optics and its applications. • nonlinear effects in non-homogeneous and
The objective is to update the research and appli- nanoscale structures
cations in the field providing a forum for discus- • organic and inorganic nonlinear materials
sion and interaction for all scientists, researchers, • special nonlinear sources (parametric, up-
and engineers interested in the new results in the and down-conversion, single photons) from
field of nonlinear optics. X-rays to Terahertz
Papers describing advances in every aspect of • quantum optics in nonlinear processes
nonlinear optics and its applications particularly, • nonlinear devices for applications
but not limited, within the following areas are wel- • nonlinear imaging systems and applications
come: • novel nonlinear materials, including plasmonic
and engineered structures
• nonlinear spectroscopy and microscopy
• ultrafast nonlinear optics
• high-field nonlinear optics
• modeling and simulations of nonlinear
processes.
Save the date
ABSTRACTS DUE:
10 NOVEMBER 2020
AUTHOR NOTIFICATION:
8 JANUARY 2021
The contact author will be notified of
acceptance by email.
MANUSCRIPTS DUE: 24 MARCH 2021
PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 5EMERGING TECHNOLOGIES
Quantum Optics and Photon Counting (OO103)
Conference Chairs: Ivan Prochazka, Czech Technical Univ. in Prague (Czech Republic);
Martin Štefaňák, Czech Technical Univ. in Prague (Czech Republic); Roman Sobolewski, Univ. of
Rochester (United States); Aurél Gábris, Czech Technical Univ. in Prague (Czech Republic), Wigner
Research Ctr. for Physics (Hungary)
Programme Committee: Josef Blazej, Czech Technical Univ. in Prague (Czech Republic);
Ralph B. James, Savannah River National Lab. (United States); Ulrich Schreiber, Technische Univ.
München (Germany); Valery Zwiller, KTH Royal Institute of Technology (Sweden)
Photon counting represents the ultimate level of block of quantum information processing. Quan-
sensitivity in optical measurements. The feasibil- tum state transfer of photons into quantum mem-
ity of individual photon detection has opened a ories and two-qubit quantum gates have been
broad spectrum of new applications in both re- recently realized and are ready to be upgraded
search and industry now. for being used in larger quantum networks and
The fast emerging types of solid state photon de- for extending the scope of applications. All these
tectors are providing simple, cheap and rugged efforts require the most possible detailed under-
tools to register and time tag photons. Super- standing of quantum physics of these objects and
conducting photon detectors, either in the form their interactions in hybrid systems. This objec-
of an ultrathin superconducting nano-stripe or a tive stimulates a large scope of experimental and
transition-edge sensor, are presently the highest theoretical researches, ranging from entangle-
performance devices, especially in the near-infra- ment theory as far as to material sciences, which
red optical spectrum. These devices are routinely fields exhibit a convergence in their objectives
used in quantum information experiments. They and terminology. In order to survey the current
exhibit high quantum efficiency, MHz counting state-of-the-art in photon-based quantum infor-
rate, and very low jitter, and can be implemented mation processing, the discussion is open to both
as photon-number and/or photon-energy resolv- fundamental aspects as well as basic and applied
ing devices. Avalanche photodiodes specifically research oriented on the realization of qubits and
designed for single photon counting have been controlled interactions.
developed on the basis of various materials during The conference programme will consist of oral
the last 30 years. They have been tailored for nu- and poster presentations on topics that include,
merous applications in optical sensors, quantum but are not limited to:
cryptography, optical ranging and Lidar, time re-
PHOTON COUNTING
solved spectroscopy, laser-induced fluorescence,
astronomy and optical time transfer, to name just • new photon counting detectors, both
a few. Finally, there is a fast growing area of pho- semiconducting and superconducting
ton counters based on various nanostructures and • time correlated photon counting advances
nanodevices, as well as high energy radiation pho- • photon number resolving detection
ton detectors for nonproliferation, security and • laser ranging and laser time transfer
medical uses. The conference will gather an au- • photon counting devices in astronomy
dience from the contributing research community • laser-induced fluorescence
active in the academic, industrial, space related, • single molecule detection
physics and research fields. • optical time domain reflectometry
Quantum Optics incorporates a variety of experi- • optical sensors
mental systems in which the interaction of single • high-energy radiation photon detectors
quantum objects can be controlled close to the ul- • imaging applications using multipixel photon
timate limit of fundamental quantum fluctuations. detectors
These quantum objects include atoms, ions and
• new and emerging applications of photon
photons, as well as artificial solid-state based ob-
counting.
jects like electrons in quantum dots, color-centers
in solids or superconducting qubits. The research
focus is on the realization of strong enough cou-
pling between quantum objects so that the con-
trolled interaction can be employed as a building
6 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21callCALL FOR PAPERS
Optical Sensors (OO104)
Conference Chairs: Francesco Baldini,
QUANTUM OPTICS Istituto di Fisica Applicata Nello Carrara
(Italy); Jiri Homola, Institute of Photonics and
• quantum communication and cryptography
Electronics of the ASCR, v.v.i. (Czech Republic);
• quantum simulation and computing Robert A. Lieberman, Lumoptix, LLC (United
• quantum sensing States)
• quantum imaging and entanglement
enhanced metrology Programme Committee: Loïc J. Blum,
Univ. Claude Bernard Lyon 1 (France);
• basic components for quantum information
Eduard Brynda, Institute of Macromolecular
processing
Chemistry of the ASCR, v.v.i. (Czech Republic);
• low dimensional interacting quantum systems Stefania Campopiano, Univ. degli Studi di
• quantum amplifiers, memories and interfaces Napoli Parthenope (Italy); Artur Dybko,
• open quantum systems: driving, dissipation Warsaw Univ. of Technology (Poland);
and control Günter G. Gauglitz, Eberhard Karls Univ.
• measurement theory Tübingen (Germany); Pedro Jorge, INESC
• quantum networks Porto (Portugal); Aleksandra Lobnik, Univ. of
• cold atoms Maribor (Slovenia); Ramaier Narayanaswamy,
• detection and metrology for quantum The Univ. of Manchester (United Kingdom);
information processing components. Terro Soukka, Univ. of Turku (Finland);
Reinhardt Willsch, Institut für Photonische
Technologien e.V. (Germany)
Over the last twenty years optical sensors have
been extensively researched in laboratories all
over the world, and numerous sensor technolo-
gies have found applications in significant fields
such as environmental monitoring, healthcare,
food safety, and security. This conference will
bring together researchers and students, as well
as developers and users of optical sensor with
the aim to discuss the latest developments and
emerging trends in optical sensing as well as cur-
rent and future applications of optical sensors.
The conference is concerned with all types of
optical sensors and all aspects of optical sensing.
Save the date The conference programme will consist of oral
and poster presentations on topics that include,
ABSTRACTS DUE: but are not limited to:
10 NOVEMBER 2020 • novel concepts in optical sensing
• components and data processing methods
AUTHOR NOTIFICATION:
for optical sensors
8 JANUARY 2021
• integrated optical sensors
The contact author will be notified of
acceptance by email. • fiber optic sensors
• optical sensor networks and distributed
MANUSCRIPTS DUE: 24 MARCH 2021 sensors
PLEASE NOTE: Submission implies the intent • optical chemical sensors and biosensors.
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 7EMERGING TECHNOLOGIES
Micro-structured and Specialty Optical
Fibres (OO105)
Conference Chairs: Kyriacos Kalli, Cyprus Univ. of Technology (Cyprus); Alexis Mendez, MCH
Engineering LLC (United States); Pavel Peterka, Institute of Photonics and Electronics of the ASCR,
v.v.i. (Czech Republic)
Programme Committee: Jean-Luc Adam, Univ. de Rennes 1 (France); John Ballato, Clemson Univ.
(United States); Ole Bang, DTU Fotonik (Denmark); Hartmut Bartelt, Institut für Photonische
Technologien e.V. (Germany); Neil G. R. Broderick, The Univ. of Auckland (New Zealand);
Benjamin J. Eggleton, The Univ. of Sydney (Australia); Christopher Emslie, Fibercore Ltd. (United
Kingdom); Sebastien Fevrier, XLIM Institut de Recherche (France); Karl-Friedrich Klein, Technische
Hochschule Mittelhessen (Germany); Jonathan C. Knight, Univ. of Bath (United Kingdom);
Michael Komodromos, Frederick Univ. (Cyprus); Hanne Ludvigsen, Aalto Univ. School of Science and
Technology (Finland); Walter Margulis, Acreo Swedish ICT AB (Sweden); Saeed Rehman, Fibercore
Ltd. (United Kingdom); Valerio Romano, Berner Fachhochschule Technik und Informatik (Switzerland);
Kay Schuster, Institut für Photonische Technologien e.V. (Germany); Waclaw Urbanczyk, Wroclaw
Univ. of Technology (Poland); David J. Webb, Aston Univ. (United Kingdom); Alexei M. Zheltikov,
Lomonosov Moscow State Univ. (Russian Federation)
Specialised optical fibres have seen a significant ufacture, devices, and applications that target the
resurgence in recent years, becoming essential fields of optical communications, fibre lasers and
optical components, designed to control and ma- amplifiers, sensing and spectroscopy; and incorpo-
nipulate light guided within an optical network, rating modelling of novel fibre geometries.
enabling selective confinement, routing, dispersion The conference programme will consist of both oral
or filtering to occur directly in the optical domain. and poster presentations. Papers are solicited on,
Specialised optical fibres can be broadly classified but not limited to, the following topics:
as solid step or gradient index types, liquid core
fibres and as photonic crystal or microstructure MATERIALS, PROCESSES AND FABRICATION
designs. In the former case, selective material dop- ADVANCES
ing of the fibres can afford unique properties that Advances in speciality and microstructure fibre
allow for optical amplification or photosensitivity. manufacture based on, silica, chalcogenide
In the latter case, photonic crystal fibre allows for and multi-component glasses, rare-earth
photon propagation in the most intricate of ways doped fibres, single crystal material fibre and
with great flexibility; we have far more control over polymer optical fibres, as well as new and
the properties of photonic crystals than we do over advanced coating materials.
the electronic properties of semiconductors. There THEORY AND MODELLING
are three key features that define the development
Modelling and simulation of linear and
of a specialised fibre i) the composition of the host
nonlinear characteristics of novel optical
material, ii) the waveguide design and iii) the use of
fibres, including modal analysis, birefringence,
specialised coatings.
polarisation and dispersion properties,
This conference aims to provide a forum for scien- confinement and bending losses, evanescent
tists and engineers-involved with the modelling, coupling in multi-core fibre and fibre tapers.
design, fabrication, device integration, and applica-
tion of PCFs and specialty optical fibres-to present TEST AND CHARACTERISATION METHODS
and share their latest research and findings. This Characterisation of optical fibres, e.g.
conference will expand on the existing innovations measurements of fibre geometry,
that relate to microstructure and speciality optical birefringence, dispersion, non-linearity and
fibres, detailing progress in the areas of fibre man- distributed measurements.
8 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21callCALL FOR PAPERS
OPTICAL COMPONENTS, SENSORS AND
DEVICES
Speciality and microstructure fibre-based
devices and their applications cover a broad
spectrum of research areas that can include:
- Supercontinuum generation, wavelength
conversion, fibre lasers and amplification,
ultra-high power and ultra-short pulse
delivery, optical clocks, pulse shaping,
dispersion compensation, micro fluidic
devices, liquid crystal fibres, and optical
transport of microparticles.
- Optical sensors, e.g. chemical and
biosensors, vectorial (multi-core structures)
and birefringent sensors (temperature and
pressure), Bragg and long period grating
sensors in specialised fibres.
- Near-field microscopy, spectroscopy of
gases and liquids.
We also encourage papers on hot topics and fields
of commercial interest such as “Optical Nanowires
and Sub-wavelength Diameter Fibres”, “Mid-IR
and Infrared Fibres”, “Active fibres for fiber lasers”,
“Specialty Fibres for Bio and Chemical Sensing”
with initiatives and advances regarding covid-19
related research considered of primary interest,
“Fibres for Harsh Environments”, “Fibres for use
in the Aerospace Industry”, “Fibres for Oil and Gas
Applications”, and “Optical Fibres in Renewal Ener-
gy Applications”.
Save the date
ABSTRACTS DUE:
10 NOVEMBER 2020
AUTHOR NOTIFICATION:
8 JANUARY 2021
The contact author will be notified of
acceptance by email.
MANUSCRIPTS DUE: 24 MARCH 2021
PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 9EMERGING TECHNOLOGIES Holography: Advances and Modern Trends (OO106) Conference Chairs: Antonio Fimia, Univ. Miguel Hernández de Elche (Spain); Miroslav Hrabovský, Palacký Univ. Olomouc (Czech Republic); John T. Sheridan, Univ. College Dublin (Ireland) Programme Committee: Augusto Beléndez, Univ. de Alicante (Spain); Andrea Bianco, INAF - Osservatorio Astronomico di Brera (Italy); Hans I. Bjelkhagen, HANSHOLO (United Kingdom); Friedrich-Karl Bruder, Covestro AG (Germany); Sergio Calixto-Carrera, Centro de Investigaciones en Óptica, A.C. (Mexico); Christiane Carre, Ecole Nationale Supérieure des Sciences Appliquées et de Technologie (France), CNRS FOTON (France), Univ. de Rennes 1 (France); Radim Chmelík, Brno Univ. of Technology (Czech Republic); Giuseppe Coppola, Istituto per la Microelettronica e Microsistemi (Italy); Claas Falldorf, Bremer Institut für angewandte Strahltechnik GmbH (Germany); Martin Fally, Univ. Wien (Austria); Tigran Galstian, Ctr. d’Optique, Photonique et Laser, Univ. Laval (Canada); Stanislovas J. Zacharovas, Geola Digital uab (Lithuania); Unnikrishnan Gopinathan, Instruments Research & Development Establishment (India); Yoshio Hayasaki, Utsunomiya Univ. Ctr. for Optical Research & Education (Japan); John J. Healy, Univ. College Dublin (Ireland); Bryan M. Hennelly, National Univ. of Ireland, Maynooth (Ireland); Ken Yuh Hsu, National Chiao Tung Univ. (Taiwan); Damien P. Kelly, Oryx Consulting (Germany); Milos Kopecky, Institute of Physics of the ASCR, v.v.i. (Czech Republic); Raymond K. Kostuk, The Univ. of Arizona (United States); Libor Kotacka, Optaglio s.r.o. (Czech Republic); Malgorzata Kujawińska, Warsaw Univ. of Technology (Poland); Jacques Lalevée, Univ. de Haute Alsace (France); Osamu Matoba, Kobe Univ. (Japan); Robert R. McLeod, Univ. of Colorado Boulder (United States); Miroslav Miler, Academy of Sciences of the Czech Republic (Czech Republic); Christoph Neipp, Univ. de Alicante (Spain); Takanori Nomura, Wakayama Univ. (Japan); Sergey B. Odinokov, Bauman Moscow State Technical Univ. (Russian Federation); Inmaculada Pascual, Univ. de Alicante (Spain); Giancarlo Pedrini, Institut für Technische Optik (Germany); Kalaichelvi Saravanamuttu, McMaster Univ. (Canada); Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China); Yasuhiro Takaki, Tokyo Univ. of Agriculture and Technology (Japan); Yasuo Tomita, The Univ. of Electro-Communications (Japan); Vladimir Y. Venediktov, Saint Petersburg Electrotechnical Univ. “LETI” (Russian Federation); Przemyslaw W. Wachulak, Military Univ. of Technology (Poland); Dayong Wang, Beijing Univ. of Technology (China); Rafael Yuste M.D., Columbia Univ. (United States); Stanislovas J. Zacharovas, Geola Digital uab (Lithuania); Haizheng Zhong, Beijing Institute of Technology (China); Igor Zhurminsky, Ctr. Suisse d’Electronique et de Microtechnique SA (Switzerland) A new era in Holography opened in 1961, when This year marks the fifth conference in this series Leith and Upatnieks described the use of the since it was inaugurated in 2009. It was founded to off-axis reference beam to capture—on a single highlight contemporary techniques of holographic piece of photographic film—the complete record recording and replay, including digital holography, of the light wave, resulting for the first time in ho- holographic materials, switchable devices, com- lographic images of excellent quality. What is less puter-generated holograms, optical information well appreciated is that by 1967 Goodman and processing, security, diffractive optics (Volume Lawrence had demonstrated a digital holograph- Holographic Optical Elements), metrology and the ic system. Our last meeting in 2017 coincided with interferometric fabrication of photonic crystals. the 90th anniversary of the births in 1927 of both We intend to provide a platform which also allows Leith (March 12th) and Denisyuk (July 27th). Today, those in closely related areas, (e.g. involving phase holography in its many forms is not only alive but retrieval algorithms, quantitative phase microsco- is thriving. It has found widespread applications py, sensing, compression, data storage and 3D im- throughout all fields of science and technology. aging and displays, and including art holography While some initial expectations have not been re- and Augmented/Mixed/Virtual Reality), to share alized, an increasing number of other applications ideas and concepts. have been discovered which have brought real practical benefits to mankind. 10 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21call
CALL FOR PAPERS
The conference is not limited to the visible parts of
the electromagnetic spectrum but also the emerg-
ing area of matter waves, e.g. holographic neutron
optics. The conference accepts submission dealing
with recording media and processing methods, ap-
plications and signal processing. Talks describing
commercial materials, systems and applications are
encouraged While all aspects of holography (aca-
demic and commercial) are of interest we strongly
encourage submissions dealing with novel appli-
cation and the optical engineering aspects of ho-
lography. This conference is dedicated to bringing
together a multidisciplinary and international mix-
ture of research professionals, developers and us-
ers of holographic techniques, devices and systems
including students and those in product develop-
ment and senior management positions.
Topics of interest include, but are not limited to:
• advances in holographic techniques (materials,
algorithms, devices and systems)
• holographic interference techniques for
fabrication and metrology
• digital holography: the capture, transmission,
processing and electronic storage of
holograms
• computer generated holograms and diffractive
optics: modelling and analysis
• digital processing of holograms and
interferometric data
• holography in nanotechnology
• novel materials and their characterization
methods for holographic applications
• real-time and active holographic recording
(modelling, materials and processes)
• dynamically switchable holograms
Save the date
(implementations and applications) ABSTRACTS DUE:
• security holography 10 NOVEMBER 2020
• holographic 3D imaging, microscopy, AUTHOR NOTIFICATION:
tomography, displays and wearables (Internet 8 JANUARY 2021
of Things, IoT)
The contact author will be notified of
• elements and systems used for the acceptance by email.
holographic storage of digital information
• holographic applications for non- MANUSCRIPTS DUE: 24 MARCH 2021
electromagnetic waves. PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 11EMERGING TECHNOLOGIES
Integrated Optics: Design, Devices, Systems
and Applications (OO107)
Conference Chairs: Pavel Cheben, National Research Council Canada (Canada); Jiří Čtyroký, Institute
of Photonics and Electronics of the ASCR, v.v.i. (Czech Republic); Iñigo Molina-Fernández, Univ. de
Málaga (Spain)
Programme Committee: Roel G. Baets, Univ. Gent (Belgium); Trevor Mark Benson, The Univ. of
Nottingham (United Kingdom); Hung-Chun Chang, National Taiwan Univ. (Taiwan);
Christopher R. Doerr, Acacia Communications Inc. (United States); Daivid Fowler, CEA-LETI (France);
Romuald Houdré, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Raman Kashyap, Ecole
Polytechnique de Montréal (Canada); Philippe Lalanne, Institut d’Optique Graduate School (France);
Xaveer J. M. Leijtens, Technische Univ. Eindhoven (Netherlands); Goran Z. Mashanovich, Univ. of
Southampton (United Kingdom); Andrea I. Melloni, Politecnico di Milano (Italy); Jarmila Müllerová,
Univ. of Žilina (Slovakia); Martin Schell, Fraunhofer-Institut für Nachrichtentechnik Heinrich-Hertz-
Institut (Germany); Laurent Vivien, Institut d’Électronique Fondamentale (France); Lech Wosinski,
KTH Royal Institute of Technology (Sweden)
The conference focuses on the design of integrated SYSTEMS AND APPLICATIONS
optical devices and systems for high impact appli- • integrated photonics for communications:
cations. Theoretical and experimental papers are datacom, access, WDM networks and coherent
solicited that report progress in the following and communications
related topics: • optical interconnects
SIMULATION AND DESIGN • integrated photonics for automotive,
• optical waveguide theory, modeling and aerospace and defence applications: beam
simulation for device design steering and LIDAR
• photonic design automation, manufacturing, • photonic sensors for nanomedicine and
and verification tools environmental monitoring: visible, NIR and MIR
• novel algorithms and photonic CAD software • integrated microwave and terahertz photonics,
for photonics and integration with electronics. and signal processing.
DEVICES
• passive and active waveguide devices
• integrable light sources, photodetectors,
modulators, amplifiers, wavelength converters,
switches, couplers, resonators, filters and
subsystems
• diffractive and subwavelength based devices Save the date
• 2D materials in waveguide photonics and
topological photonics ABSTRACTS DUE:
10 NOVEMBER 2020
• plasmonic and hybrid integrated plasmonic-
photonic devices. AUTHOR NOTIFICATION:
8 JANUARY 2021
The contact author will be notified of
acceptance by email.
MANUSCRIPTS DUE: 24 MARCH 2021
PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
12 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21callCALL FOR PAPERS
EUV and X-ray Optics:
Synergy between Laboratory and Space (OO108)
Conference Chairs: René Hudec, Astronomical Institute of the ASCR, v.v.i. (Czech Republic), Czech
Technical Univ. in Prague (Czech Republic); Ladislav Pina, Czech Technical Univ. in Prague (Czech
Republic)
Programme Committee: Jens Biegert, ICFO - Institut de Ciències Fotòniques (Spain);
Webster Cash, Univ. of Colorado at Boulder (United States); Thorsten Döhring, Hochschule
Aschaffenburg (Germany); Henryk Fiedorowicz, Military Univ. of Technology (Poland); René Hudec,
Czech Technical Univ. in Prague (Czech Republic); Randall L. McEntaffer, The Univ. of Iowa (United
States); Stephen L. O’Dell, NASA Marshall Space Flight Ctr. (United States); Giovanni Pareschi,
INAF - Osservatorio Astronomico di Brera (Italy); Ladislav Pina, Czech Technical Univ. in
Prague (Czech Republic); Yuriy Y. Platonov, Rigaku Innovative Technologies, Inc. (United States);
Paul B. Reid, Harvard-Smithsonian Ctr. for Astrophysics (United States); Bedřich Rus, ELI Beamlines
(Czech Republic), Institute of Physics of the ASCR, v.v.i. (Czech Republic); Frank Siewert, Helmholtz-
Zentrum Berlin für Materialien und Energie GmbH (Germany); William W. Zhang, NASA Goddard
Space Flight Ctr. (United States); Paola Zuppella, CNR-Istituto di Fotonica e Nanotecnologie (Italy)
Extreme Ultraviolet (EUV) and X-ray Optics have Presentations discussing technologies for future
many applications in many areas of recent science space X-ray astronomy missions are encouraged.
and technology ranging from space (astronomy) to These missions require development of mostly in-
the laboratory, and numerous alternative designs of novative technologies; the possibilities, the results
these optics have been suggested and implement- obtained so far and details of new ideas are suit-
ed. The apertures range from micromirrors of less able topics for discussion. The recent situation in
than 1 mm to a few meters in the case of space ap- the field strongly demonstrates the urgent need of
plications. Novel schemes of source-optics systems novel, cost effective approaches and solutions.
and experimental results show higher brightness It is clear that the requirements of future large
and better imaging or diagnostic capabilities. X-ray astronomy missions are so demanding that
The purpose of this conference is to bring together they need a truly interdisciplinary approach in a
scientists, manufacturers, optical and mechanical wide international collaboration. The technologies
engineers, designers and users of EUV and X-ray will include X-ray optics based on Si wafers and ad-
optics, in order to exchange ideas, highlight possi- vanced glass forming for precise X-ray optics, but
ble problems and challenges linked to their use and also other possibilities, as well as related advanced
to seek ways to overcome the current limitations. metrology, measurement and testing. These tech-
New or potential users of EUV and X-ray optics will nologies can also be used for laboratory EUV and
benefit from clear reviews by experienced special- X-ray optics, and presentations based on such ap-
ists discussing the advantages and disadvantages plications will be welcome. In addition, discussions
of these advanced optical arrangements. An im- of new projects and results achieved in synchrotron
portant part of the meeting will be dedicated to and laboratory EUV and X-ray optics are requested,
the use of adaptive EUV and X-ray optics: how to including considerations of how related fields can
improve their performances, and reviewing new re- benefit from these achievements.
sults and recent advances. Both the laboratory and space EUV and X-ray com-
An additional goal of the conference is to bring munities have begun efforts in the development of
together EUV and X-ray optical scientists special- active / adaptive optics with the aim of achieving
ising in both terrestrial and space applications, with superfine angular or spatial resolutions. This con-
benefits for both sides. Many application areas of ference will also cover all aspects, development
EUV and X-ray optics require novel technologies and use of such optical techniques. Researchers
and new approaches in order to achieve better im- (including industrial partners) working in the fol-
aging quality, and some approaches designed and lowing aspects of EUV and X-ray optics are encour-
developed originally for space optics should also aged to submit papers for consideration:
be applicable in laboratory optics, and vice versa.
(continued next page)
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 13EMERGING TECHNOLOGIES
EUV and X-ray Optics:
Synergy between Laboratory and Space (OO108 continued)
• overviews of EUV and X-ray optics
technologies for laboratory and space
• overviews of applications of EUV and X-ray
optics
• reflective, diffractive and refractive EUV and
X-ray optics
• novel concepts, designs and technologies for
EUV and X-ray optics
• theory, modelling and simulation of EUV and
X-ray optics
• integrated devices and systems (sources,
optics, detectors)
• devices and fabrication approaches to achieve
improved quality EUV and X-ray optics
• active / adaptive EUV and X-ray optics
• multilayer X-ray optics
• optics for hard X-rays
• electronics and control of EUV and X-ray
optical devices and systems
• measurement, characterization and
assessment of EUV and X-ray optical devices
and systems, including reliability
• new classes of experiments and improvements
to existing techniques
• scientific results obtained with EUV and X-ray
optics.
The conference organisers hope to receive contri-
butions from experienced groups from important
world facilities and institutes (including industrial
partners). The aim is to focus on the leading current
EUV and X-ray optics technologies, and those with
the potential to be realizable in the future.
Save the date
ABSTRACTS DUE:
10 NOVEMBER 2020
AUTHOR NOTIFICATION:
8 JANUARY 2021
The contact author will be notified of
acceptance by email.
MANUSCRIPTS DUE: 24 MARCH 2021
PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
14 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21callCALL FOR PAPERS
High-Power, High-Energy, and High-Intensity
Laser Technology (OO109)
Conference Chairs: Joachim Hein, Friedrich-Schiller-Univ. Jena (Germany)
Programme Committee: Jens Biegert, ICFO - Institut de Ciències Fotòniques (Spain);
Gonçalo N. Figueira, Instituto de Plasmas e Fusão Nuclear (Portugal); Junji Kawanaka, Osaka Univ.
(Japan); Jörg Körner, Friedrich-Schiller-Univ. Jena (Germany); Luca Labate, Consiglio Nazionale
delle Ricerche (Italy); Evgeny A. Perevezentsev, Institute of Applied Physics of the RAS (Russian
Federation)
This conference will be dedicated to the underlying JOINT SESSION
science and new developments in the field of lasers Conferences High-Power, High-Energy, and High-In-
producing high-pulse energies, high-peak or aver- tensity Laser Technology (OO109), Short-pulse
age powers. Such laser systems are essential tools High-energy Lasers and Ultrafast Optical Technol-
for research in laser matter interaction, as drivers ogies (OO110), and Research Using Extreme Light:
for various kinds of physical processes including Entering New Frontiers with Petawatt-Class Lasers
acting as pump sources and secondary source gen- (OO114) will organize a joint session dedicated to
eration, and for industrial applications including technologies for the next generation ultra-high
materials processing. The whole wavelength range peak power lasers.
from the UV to the upcoming mid-IR is covered. Pa-
pers are especially solicited on the following topics: Submissions discussing the following topics are
encouraged:
SYSTEMS • novel amplifier schemes
• new types of lasers capable of producing high • new cooling techniques
power or ultrashort pulses • advanced materials and optics for high peak
• high-energy DPSSL, flash-lamp pumped solid power lasers
state, or gas lasers • new high intensity laser metrology methods.
• high-power laser architectures including fiber
and thin disc lasers
• mid-infrared lasers, materials and devices as
well as applications
• high-power diode lasers as pump sources.
PROCESSES
• broadband, high-energy, or high average-
power parametric amplification
• high-energy or high-power frequency
conversion
• THz and X-ray generation
• laser oscillator and amplifier dynamics
• coherent and incoherent combination of laser
pulses.
SUPPORTING TECHNOLOGIES
• laser materials and their characterization
• improvement of laser-induced damage
threshold optics
• advanced cooling schemes for solid state
lasers
• fast laser modulators and modulators that can
handle high average or high peak power
• new techniques in laser metrology.
Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 15EMERGING TECHNOLOGIES
Short-pulse High-energy Lasers and Ultrafast
Optical Technologies (OO110)
Conference Chairs: Pavel Bakule, Institute of Physics of the CAS, v.v.i. (Czech Republic);
Constantin L. Haefner, Lawrence Livermore National Lab. (United States)
Petawatt lasers with wide range of specifications in JOINT SESSION
terms of energy, pulse duration and repetition rate Conferences High-Power, High-Energy, and High-In-
are now operating or are under construction at a tensity Laser Technology (OO109), Short-pulse
multitude of facilities around the world. Demon- High-energy Lasers and Ultrafast Optical Technol-
strating a peak power of 10 PW seems to be within ogies (OO110), and Research Using Extreme Light:
reach and 100 PW lasers are on the drawing board. Entering New Frontiers with Petawatt-Class Lasers
All of this investment into new laser technology de- (OO114) will organize a joint session dedicated to
velopment is needed to access a wide variety of technologies for the next generation ultra-high
scientific applications. peak power lasers.
This conference will be dedicated to discussing the Submissions discussing the following topics are
laser physics, technology and architecture under- encouraged:
lying the development of high energy short pulse • novel amplifier schemes
laser systems and specifically large petawatt laser
• new cooling techniques
systems. Contributions are expected on the follow-
ing topics: • advanced materials and optics for high peak
power lasers
SHORT PULSE AMPLIFICATION TECHNOLOGIES • new high intensity laser metrology methods.
• large scale Petawatt lasers and high peak
power laser systems
• high energy short pulse generation and
amplification
• broadband OPCPA technologies
• high energy, broadband amplifiers based on
Ti:Sapphire and other novel materials
• high temporal contrast, short pulse front end
technology.
DISPERSION MANAGEMENT
• broadband spectral shaping and dispersion
management techniques
• high energy and high average power
compressors.
Save the date
ENGINEERING CHALLENGES ABSTRACTS DUE:
• short pulse measurement and diagnostics 10 NOVEMBER 2020
• short pulse coherent beam combination for AUTHOR NOTIFICATION:
high intensity 8 JANUARY 2021
• large aperture broadband optics The contact author will be notified of
• precision laser timing and synchronization acceptance by email.
techniques.
MANUSCRIPTS DUE: 24 MARCH 2021
PLEASE NOTE: Submission implies the intent
of at least one author to register, attend the
conference, present the paper as scheduled, and
submit a full-length manuscript for publication
in the conference proceedings.
Submit your abstract today: spie.org/oo21call
16 SPIE OPTICS + OPTOELECTRONICS 2021 • www.spie.org/oo21callEXTREME LIGHT SOURCES Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8) (OO111) Conference Chairs: Libor Juha, Institute of Physics of the ASCR, v.v.i. (Czech Republic); Saša Bajt, Deutsches Elektronen-Synchrotron (Germany); Stéphane Guizard, CEA-DRF-IRAMIS, Lab. des Solides Irradiés (France) Programme Committee: Fred Bijkerk, Univ. Twente (Netherlands); Jaromír Chalupský, Institute of Physics of the ASCR, v.v.i. (Czech Republic); Henryk Fiedorowicz, Military Univ. of Technology (Poland); Jacek Krzywinski, SLAC National Accelerator Lab. (United States); Klaus Mann, Laser-Lab. Göttingen e.V. (Germany); Tomáš Mocek, Institute of Physics of the ASCR, v.v.i. (Czech Republic); Ladislav Pina, Czech Technical Univ. in Prague (Czech Republic); Jorge J. Rocca, Colorado State Univ. (United States); Michael Störmer, Helmholtz-Zentrum Geesthacht (Germany); Marco Truccato, Univ. degli Studi di Torino (Italy); Philippe Zeitoun, Ecole Nationale Supérieure de Techniques Avancées (France); Beata Ziaja-Motyka, Deutsches Elektronen-Synchrotron (Germany) The conference will be devoted to the study of • thermally induced transient deformations damage to optical elements and patterning of ma- of optical surfaces and related wave-front terial surfaces irradiated by high average and/or changes (thermal lensing) high peak fluxes of radiation in the extreme ultravi- • challenges for radiation damage and material olet and x-ray spectral regions. The following main processing studies associated with the current subjects will be covered by the conference: development of compact, high-repetition • irreversible changes occurring in solids EUV/x-ray free-electron lasers, often called cw exposed to synchrotron radiation, high-order FELs harmonics, discharge- and laser-plasma based • utilization of damage patterns on irradiated sources of incoherent EUV/x-ray radiation, and surfaces to characterize the EUV/x-ray EUV/x-ray laser beams, including free-electron radiation field lasers (FELs) • analytical techniques and procedures for • chain scissions and crosslinking in EUV/x-ray- detailed characterization of changes in exposed polymers, esp. EUV/x-ray resists irradiated condensed phase • relationships between EUV/x-ray desorption, • formation of carbonaceous deposit (carbon ablation and phase transitions black) from residual gases on irradiated • transient phenomena pumped and/or probed surfaces by short or ultra-short EUV/x-ray pulses • computer simulation of processes induced in • influence of radiation damage to samples on solids by EUV/x-ray pulses at microscopic and their imaging and structural analysis macroscopic levels • EUV/x-ray laser induced periodic surface • calculations of damage limits for optical structures (EUV/x-ray LIPSS) components used with intense short- • direct micro- and nano-patterning by intense wavelength radiation sources EUV/x-ray radiation modulated by masks or in • strategies for the design of optical elements interferometers to avoid or reduce their EUV/x-ray radiation • optimization of irradiation conditions to damage. produce tailored micro(nano)structures Special attention will be paid to the practical im- • comparing responses of thin film coatings, portance of these subjects to direct EUV/x-ray mi- multilayer structures, gratings and bulk cro(nano)structuring, EUV/x-ray nanolithography, materials to intense short-wavelength radiation focusing of incoherent emission from plasma-based • radiation damage to interfaces point sources, and manipulation/characterization • dual action of short (EUV/x-ray) and long of radiation from new generation EUV/x-ray la- (UV/Vis/NIR) wavelength radiation on solid sers and other ultra-intense sources, such as FELs, surfaces (e.g., LCLS, SACLA, FLASH, DCLS, FERMI, SXFEL, • advanced diagnostics for investigation of PAL-XFEL, SwissFEL and European XFEL) and ad- formation and development changes initiated vanced laser-driven sources (e.g., LASERIX, PALS in and on various materials and structures by and ELI Beamlines). intense EUV/x-ray radiation Tel: +1 360 676 3290 • help@spie.org • #SPIEOptoelectronics 17
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